ISSP2017: Symposium Program

Wednesday 5 Oral Session

Welcome Address

Opening Session / Fundamentals of Sputtering and Plasma

10:00 KN-1 Plasma-surface interactions in nanofabrication and space exploration, Kouichi Ono*, Kyoto University, Japan (KEYNOTE)

10:40 FS1-1 In-situ diagnostics of high-power impulse magnetron sputtering: from non-reactive sputtering and spokes to reactive sputtering, Nikolay Britun1)*, Alexandr Belosludtsev2), Stephanos Konstantinidis1), Ante Hecimovic3), Rony Snyders1,4), 1) University of Mons, Belgium, 2) University of West Bohemia, Czech Republic, 3) Ruhr-University Bochum, Germany, 4) Materia Nova Research Center, Belgium

11:00 FS1-2 Chalcogenide glasses from (GeSe2)100-x(Sb2Se3)x system: Plasma plume dynamics and properties, S. Irimiciuc1,2), P. Nemec3)*, R. Boidin3), G. Bulai2,4), S. Gurlui2), V. Nazabal5,3), C. Focsa1), 1) Université de Lille 1 Sciences & Technologies, France, 2) Faculty of Physics, LOA-SL, “Al. I. Cuza” University of Iasi, Romania, 3) Department of Graphic Arts and Photophysics, Faculty of Chemical Technology, University of Pardubice, Studentska 573, 53210 Pardubice, Czech Republic, 4) Integrated Centre for Environmental Science Studies in the North-East Development Region - CERNESIM, “Al. I. Cuza” University of Iasi, Romania, 5) Université de Rennes 1, France

11:20 FS1-3 Return of target material ions leads to a reduced hysteresis in reactive high power Impulse Magnetron Sputtering, Jiri Capek1)*, Stanislav Kadlec2), 1) University of West Bohemia, Czech Republic, 2) HVM Plasma Ltd., Czech Republic

11:40 FS1-4 On the cause of a double hysteresis during reactive magnetron sputtering, Koen Strijckmans*, Roeland Schelfhout, Diederik Depla, Ghent University, Belgium

12:00 FS1-5 Ionization cloud formation in rotary cathode plasma confinement, Patrick Morse*, Sputtering Components Inc., USA

Lunch Break 12:20-13:20

Thin Films I 13:20-15:00

13:20 TF1-1 Plasma deposition of advanced thin films and nanostructured materials at CSIRO, Avi Bendavid*, CSIRO, Australia (invited)

14:00 TF1-2 Optical properties of multilayers consisting of Al surface layer and Ag thin film, Midori Kawamura1)*, Takayuki Kiba1), Yoshio Abe1), Kyung Ho Kim1), Hiroshi Murotani2), 1) Kitami Institute of Technology, JAPAN, 2) Tokai University, JAPAN

14:20 TF1-3 Preparation of TiN films using high power impulse magnetron sputtering combined with bipolar type plasma based ion implantation system, Setsuo Nakao1)*, Yasusei Yamada1), Kingo Azuma2), Takashi Kimura3), 1) National Institute of Advanced Industrial Science and Technology (AIST), Japan, 2) University of Hyogo, Japan, 3) Nagoya Institute of Technology, Japan

14:40 TF1-4 Critical layer to tailor the orientation distribution for the fabrication of high Hall mobility n-type doped ZnO polycrystalline films deposited by direct-current magnetron sputtering, Junichi Nomoto1)*, Minoru Osada2), Katsuhiko Inaba3), Shintaro Kobayashi3), Hisao Makino1), Tetsuya Yamamoto1), 1) Kochi University of Technology, Japan, 2) International Center for Materials Nanoarchitectonics, National Institute of Materials Science, Japan, 3) Rigaku Corporation, Japan

15:00-15:20 Coffee Break

Sputtering Processes I 15:20-17:00

15:20 SP1-1 R2R-HIPIMS to produce functional coatings, Ju-Liang He*, Yu-De Liou, Ming-Ta Mou, Thi-Thuy-Nga Nguyen, Ying-Hung Chen, Kuo-Bing Cheng, Feng Chia University, Taiwan (invited)

16:00 SP1-2 Coating of large area substrates with the rotatable cathode array – Implications on layer properties, Hyun Chan Park, Ajay Sampath Bhoolokam, Daniel Severin*, Andreas Klöppel, Jian Liu, Sabine Nölker, Markus Hanika, Marcus Bender, Applied Materials GmbH & Co. KG, Germany

16:20 SP1-3 Novel DC-like sputtering with single and dual magnetron setups, Holger Proehl*, Thomas Niederhausen, Frank Benecke, VON ARDENNE GmbH, Germany

16:40 SP1-4 Reactive high density pulse plasma sputtering of ceramic coatings for industrial applications., Roman Chistyakov*, Zpulser, LLC, USA

Wednesday 5 Poster Session 17:20-19:00
(Drinks and Light Meals will be served)

Fundamentals of Sputtering and Plasma POSTER

FS1-6p Numerical simulation on the positive ion flux in a DC-magnetron system, Seiji Ogata1)*, Hirotake Sugawara2), 1) Atelier Modeling, Japan, 2) Hokkaido University, Japan

FS1-7p Two-dimensional simulations of multi-hollow cathode VHF SiH4/H2 plasma, Li-Wen Su*, Weiting Chen, Kiichiro Uchino, Yoshinobu Kawai, Kyushu University, Japan

FS1-8p Development of optimal DLC film deposition and pulsed power supplies in medical implants by the HiPIMS method, Masahide Kuroiwa1)*, Tadayuki Okano1), Kohei Yamamoto2), Tatsuyuki Nakatani2), 1) Tokyo Electronics Co., Ltd., Japan, 2) Okayama University of Science, Japan

FS1-9p Evaluation of plasma parameters for hollow cylindrical magnetron sputtering cathode, Kakeru Kodama*, Hiroshi Iwata, Masashi Furusawa, Masatoshi Tanaka, Takao Sekiya, Yokohama National University, Japan

FS1-10p 3D Monte Carlo model of etching low-k films by F atoms, Alexander P Palov1)*, Tatyana V Rakhimova1), Ekaterina N Voronina1,2), Yuri A Mankelevich1), 1) Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Russia, 2) Faculty of Physics, Lomonosov Moscow State University, Russia

FS1-11p 3D Monte Carlo model of sputtering low-k films by Ar atoms, Alexander P Palov1)*, Ekaterina N Voronina1,2), Tatyana V Rakhimova1), 1) Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Moscow, Russia, 2) Faculty of Physics, Lomonosov Moscow State University, Moscow, Russia

Thin Films POSTER I

TF1-5p Transparent diamond-like carbon thin films on Tte glass substrate, Yan-Yu Liao1)*, Wei-Bo Liao2), Cheng-Chung Lee2), Chien-Cheng Kuo2), 1) Department of Mechanical Engineering, National Central University, Taiwan, 2) Thin Film Technology Center, National Central University, Taiwan

TF1-6p Virtual Coater: simulation of film growth deposited by magnetron sputtering in any coater and evaluation of their morphological and optical properties., Stephane Lucas*, Jerome Müller, Pavel Moskovkin, University of Namur, Belgium.

TF1-7p Influence of argon flow rate on the properties of magnetron sputtered aluminum-doped zinc-oxide thin films, Hasitha Mahabaduge*, Georgia College & State University, USA

TF1-8p Combining reactive magnetron sputtering and GLAD to synthesize porous TiO2 coatings for DSSC applications: an experimental and theoretical study., Jonathan Dervaux1), Pierre-Antoine Cormier1), Stéphane Lucas2), Rony Snyders1)*, 1) University of Mons, Bergium, 2) University of Namur, Bergium

TF1-9p Analysis of DLC thin films obtained by XPS spectrum separation, Kenji Yamada1)*, Atsuto Takeda1), Takahiro Imai2), Yushi Iijima2), Toru Harigai2), Yoshiyuki Suda2), Hirofumi Takikawa2), 1) National Institute of Technology, Ishikawa College, Japan, 2) Toyohashi University of Technology, Japan

TF1-10p Properties of Al-Ga co-doped ZnO semiconductor thin films deposited on PET substrates by RF magnetron sputtering, Chien-Yie Tsay*, Kun-Che Pai, Feng Chia University, Taiwan

TF1-11p An Na source via MoNa intermediatelayer for three-stage evaporation of Cu(In,Ga)Se2 solar cells, Du-Cheng Tsai*, Fuh-Sheng Shieu, National Chung Hsing University, Taiwan.

TF1-12p Self-propagating exothermic reaction behavior of Ti/SiOx multilayer films, Shozo Inoue1)*, Mitsuyoshi Mizutani1), Keita Inoue1), Keisuke Yoshiki1), Takahiro Namazu2), 1) University of Hyogo, Japan, 2) Aichi Institute of Technology, Japan

TF1-13p Decrease of viewing angle dependence of niobium oxide (Nb2O5) thin films prepared by an anodization treatment due to deposition of sputtered titanium oxide (TiO2) thin film, Yuta Shimoyama1)*, Kosei Matsunaka2), Isao Komatsu3), Shuichi Maeda2,3), Satoru Iwamori1), 1) Course of Mechanical Engineering,Graduate School of Engineering,Tokai University, Japan, 2) Course of Electro Photo Optics, Graduate School of Engineering, Tokai University, Japan, 3) Course of Information Science and Technology, Graduate School of Science and Technology, Tokai University, Japan

TF1-14p Effect of oxygen plasma treatment on an ITO-based point-contact resistive memory, Chih-Yi Liu1), Yu-Xuan Zhang1)*, Shyh-Jer Huang2), Chun-Hung Lai3), 1) National Kaohsiung University of Applied Sciences,Taiwan, 2) National Cheng Kung University,Taiwan, 3) National United University,Taiwan

TF1-15p Effect of Ge thickness on optical property, crystallization mechanism, and recording performance of Ge/GeCu recording layer for blue laser recording applications, Sin-Liang Ou1)*, Wei-Sheng Huang2), Kuo-Sheng Kao2), 1) Da-Yeh University, Taiwan, 2) Shu-Te University, Taiwan

TF1-16p Characterization of ZrON thin films prepared by reactive sputtering using a hollow cylindrical cathode, Hiroshi Iwata*, Hiroki Ishii, Daiki Kato, Shohei Kawashima, Kakeru Kodama, Masatoshi Tanaka, Takao Sekiya, Yokohama National University, Japan

TF1-17p Tunnel magnetoresistance effect of granular films using CoFeAlSi alloy, Yuji Fujiwara1)*, Mutsuko Jimbo2), Toshifumi Shimizu2), 1) Mie University, Japan, 2) Daido University, Japan

TF1-18p Carbon film fabricated by reactive sputtering method using various process gases, Shunpei Ota*, Kazushi Fuse, Yusuke Miyaguchi, Shun Manita, Hyung-Woo Ahn, Takehito Jimbo, ULVAC, Inc., Japan

TF1-19p Structures, electrical and magnetic properties of (Al, Co) co-doped ZnO films deposited by RF magnetron sputtering, S. C. Chen1), Y. W Lin1), S. Y. Huang1)*, H. Sun1), C. H. Wang1), C. K. Wen2), T. H. Chuang2), 1) Ming Chi University of Technology, Taiwan, 2) National Taiwan University, Taiwan

Micro and Nano Technologies POSTER

MN1-1p Filter-free, junctionless structures for color sensing, Keng-Te Lin1), Tzu-Yao Lin1)*, Yu-Sheng Lai2), 1) National Taiwan University, Taiwan, 2) National Nano Device Laboratories, Taiwan

MN1-2p Characterization of nano-porous Ta, TaON, and Ta2O5 films synthesized by co-sputtering and de-alloying approach, J. H. Hsieh, S. H. Wu*, Y. C. Lin, Ming Chi University of Technology. Taiwan

MN1-3p Formation of interelectrode bridging of carbon nanotube filaments by gas discharge breakdown, Yuuki Mizushima*, Seiji Funaki, Hideki Sato, Mie University, Japan

MN1-4p Control of graphene growth by tuning of catalyst film, Daiki Tamai*, Yukihiko Akiyoshi, Hideki Sato, Hideto Miyake, Kazumasa Hiramatsu, Graduate School of Engineering, Mie University, Japan

Thursday 6 Oral Session

Sputtering Processes II 9:00-10:40

09:00 KN2 Industrialisation of high power impulse magnetron sputtering, Arutiun P. Ehiasarian*, Papken Eh. Hovsepian, Sheffield Hallam University, UK (KEYNOTE)

09:40 SP2-1 High rate sputter deposition of electrochromic nickel oxide thin films using substrate cooling and water vapor injection, Yoshio Abe*, Shun Yamauchi, Midori Kawamura, Kyung Ho Kim, Takayuki Kiba, Kitami Institute of Technology, Japan

10:00 SP2-2 Limitations of voltage controlled transition mode sputtering in industrial large area coating, Moritz Heintze*, Ioana Luciu, TRUMPF Hüttinger GmbH + Co. KG, Germany

10:20 SP2-3 Feedback control of reactive high power impulse magnetron sputtering by measuring the pulse peak current and adjusting the pulse frequency, Rafael Sanchez1)*, Tetsuhide Shimizu2,3), Michelle Marie Villamayor2), Julien Keraudy2), Daniel Lundin1,4), Ulf Helmersson1,2), 1) Ionautics AB, Sweden, 2) Linköping University, Sweden, 3) Tokyo Metropolitan University, Japan, 4) Université Paris-Sud, France

Coffee Break 10:40-11:00

Sputtering Processes III 11:00-11:40

11:00 SP2-4 Effects of internal stress on sputtered Fe-Sm thin films, Shota Sakano*, Yoshihito Tsukagoshi, Helmut Takahiro Uchida, Yoshihito Matsumura, Tokai University, Japan

11:20 SP2-5 Control of oxygen content in MgO thin film by peak pulse current regulation in reactive HiPIMS, Shuga Ikeda*, Tetsuhide Shimizu, Hidetoshi Komiya, Ming Yang, Tokyo Metropolitan University, Japan

Plasma Induced Process Technologies/Others 11:40-12:40

11:40 PI2-1 A vacuum species sensor using remote plasma emission spectroscopy for direct monitoring of vacuum processes, Dermot Monaghan*, Joseph Joseph Brindley, Victor Bellido-Gonzalez, Gencoa, UK

12:00 OT2-1 Reactive deposition – enabling enhanced thin film performance, David Sanchez*, Materion Advanced Materials Group, USA (invited)

Lunch Break 12:40-14:00

Thin Films II 14:00-15:20

14:00 TF2-1 Magnetron sputter deposition of CoCrCuFeNi thin films, Diederik Depla*, Bert Braeckman, Robin Dedoncker, Ghent University, Belgium

14:20 TF2-2 Fracture behavior of diamond-like carbon (DLC) films coated on polymer substrates, Go Yamamoto1)*, Noriaki Ikenaga2), Tomonaga Okabe1), 1) Tohoku University, Japan, 2) Kanazawa Institute of Technology, Japan

14:40 TF2-3 Mechanical properties of CrZrN Coatings by sputtering process, Ji-Hoon Yang*, Sung-Hwan Kim, In-Seop Byeon, Jae-In Jeong, Research Institute of Industrial Science and Technology, Korea

15:00 TF2-4 On the synthesis and properties of reactively sputter deposited oxygen vacancy stabilized zirconia thin films., Stephanos Konstantinidis1)*, Mohsin Raza1), David Cornil2), Jérôme Cornil2), Stéphane Lucas3), Jean-François Pierson4), Pascal Boulet4), Hervé Rinnert4), David Horwat4), Lucia dos Santos Gomez5), Vincenzo Esposito5), Simone Sanna5), Rony Snyders1), 1) Laboratory of Plasma-Surface Interaction Chemistry, University of Mons, Belgium, 2) Service de Chimie des Matériaux Nouveaux, University of Mons, Belgium, 3) University of Namur, Belgium, 4) Université de Lorraine, France, 5) Technical University of Denmark, Denmark

Break 15:20-15:40

Thin Films III 15:40-17:00

15:40 TF2-5 Control of microstructure of FePt-X (001) films for HAMR through interface modification and doping, Jingsheng CHEN*, National University of Singapore, Singapore (invited)

16:20 TF2-6 Effect of gaseous impurity level of sputtering target on the piezoelectric property of Al-Sc-N thin film, Yasushi Morii*, Yuichiro Nakamura, Takeo Okabe, Yoshimasa Koido, Hideyuki Takahashi, JX Nippon Mining & Metals Corporation, Japan

16:40 TF2-7 Target material trends in flat panel display and energy applications, Christoph Adelhelm*, Christian Linke, Enrico Franzke, Harald Köstenbauer, Hennrik Schmidt, Jörg Winkler, Plansee SE, Austria

Thursday 6 Poster Session 17:00-19:00
(Drinks and Light Meals will be served)

Sputtering Processes POSTER

SP2-6p A novel way to quantify compound sputter yields during reactive magnetron sputtering, Roeland Schelfhout*, Koen Strijckmans, Diederik Depla, Ghent University, Belgium

SP2-7p Effect of oblique incidence of sputtered and fast particles on crystal orientation in tungsten thin film formation, Yasuhito Gotoh*, Hirofumi Fujiwara, Hiroshi Tsuji, Kyoto University, Japan

SP2-8p Phase formation and gas-sensing performance of ZnO-SnO2 core-shell nanords through postannealing sputtering deposited tin sulfide shell layer, Yuan-Chang Liang, Ya-Ju Lo*, National Taiwan Ocean University, Taiwan

SP2-9p Sputtering-assisted synthesis of TiO2-CdO composite rods and their oxidizing gas sensing performance, Yuan-Chang Liang, Chein-Chung Wang*, National Taiwan Ocean University, Taiwan

SP2-10p Effects of sputtering power of indium oxide on photoactivity and gas sensing properties of cosputtering deposited c-axis-oriented In-doped ZnO thin films, Yuan-Chang Liang*, Chia-Min Lee, National Taiwan Ocean University, Taiwan

SP2-11p The tribological behavior and oxidation resistance of Ta-Si-N coatings by high power impulse magnetron sputtering, Li-Chun Chang1,2)*, Ya-Wen You1), 1) Department of Materials Engineering, Ming Chi University of Technology, Taiwan, 2) Center for Thin Film Technologies and Applications, Ming Chi University of Technology, Taiwan

SP2-12p RF power and gas pressure dependences on structural, electrical and optical properties of Al doped ZnO films on glass substrate prepared using magnetron sputtering with multipolar magnetic plasma confinement, Shouki Yahagi*, Hiroshi Toyota, Hiroshima Institute of Technology, Japan

SP2-13p Target DC power dependence on structural and electrical properties of Ni films on flexible substrate prepared using magnetron sputtering with multipolar magnetic plasma confinement assisted by inductively coupled plasma, Tatsuya Tachibana*, Hiroshi Toyota, Hiroshima Institute of Technorogy, Japan

SP2-14p High conductivity AZO film synthesis by particle flux control in magnetron sputtering, Long Wen*, Su B Jin, B.B. Sahu, Jeon G Han, Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Korea

SP2-15p Control of Cu film stress using DC-pulsed magnetron sputtering, Dohan Kim1)*, Youjin Ji1), Taehyung Kim1), Wonkyun Yeom2), Hoseok Lee2), Kyoungnam Kim3), 1) Department of Materials Science and Engineering, Sungkyunkwan University, Korea, 2) SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Korea, 3) Daejun University, Korea

SP2-16p Influence pulsed voltage biasing upon titanium deposition by high-power pulsed sputtering penning discharge in ambient nitrogen/argon mixture gas, Kingo Azuma1)*, Yuma Kusuhashi1), Ryo Nagai1), Yoshihiro Oka1), Takashi Kimura2), Setsuo Nakao3), 1) University of Hyogo, Japan, 2) Nagoya Institute of Technology, Japan, 3) Advanced Industrial Science and Technology, Japan

SP2-17p The Effect of substrate temperature for thermal and true stress on sputtered thin films, Maki Hashimoto, Yoshihito Tsukagoshi*, Shouta Sakano, Helmut Takahiro Uchida, Yoshihito Matsumura, Tokai University, Japan

Plasma Induced Process Technologies POSTER

PI2-2p Plasma based process to deposit thick and dense Li metallic coatings, Stephane Lucas*, University of Namur, Belgium.

PI2-3p Ammonia plasma treatment on stacked SiOx/HfO2 solid electrolytes of silver programmable metallization cells with tunable multilevel resistive switching behaviors, Ya-Ting Chan1), Bo-Xiang Wang1), Jer-Chyi Wang1,2,3)*, 1) Chang Gung University, Taiwan, 2) Chang Gung Memorial Hospital, Taiwan, 3) Ming Chi University of Technology, Taiwan

PI2-4p Oxidation of Si and Ti surfaces using oxygen plasma treatment, Satoshi Koyama, Junichi Yanagisawa*, The University of Shiga Prefecture, Japan

Thin Films POSTER II

TF2-8p Stress analysis of SiOxCy thin films deposited by plasma polymerization, Yu-Tian Lin*, Wei-Bo Liao, Yan-Yu. Liao, Cheng-Chung Lee, Chien-Cheng Kuo, Thin Film Technology Center, National Central University, Taiwan

TF2-9p The effect of oxygen working pressure on microstructures and optoelectronic properties of NiO thin films deposited by reactive magnetron sputtering, S. C Chen1), S. Y Huang1)*, H. Sun1), C.K. Wen2), S.W. Hsu1), T.H. Chuang2), 1) Ming Chi University of Technology, Taiwan, 2) National Taiwan University, Taiwan

TF2-10p Effect of vapor incidence angle and bias voltage on the structure and properties of TiN and Al films, Jae-In Jeong*, Ji-Hoon Yang, Sung-Hwan Kim, Jae-Hun Jung, In-Seop Byun, Research Institute of Industrial Science & Technology, Korea

TF2-11p The microstructure, optical and mechanical properties of Al-Si-B-N hard coatings deposited by reactive magnetron sputtering, Yung-Cheng Liu*, Du-Cheng Tsai, Fuh-Sheng Shieu, National Chung Hsing University, Taiwan

TF2-12p Gas sensing characteristics of zinc oxide thin films prepared by r.f. sputtering, vacuum evaporation and laser ablation in liquid, Masahiro Kinoshita1)*, Shouta Mukouyama1), Prabakaran Shankar1), Sergei Kulinich1), Kazutoshi Noda2), Satoru Iwamori1), 1) Tokai University, Japan, 2) National Institute of Advanced Industrial Science and Technology, Japan

TF2-13p Growth of VO2 thin films on transparent conductive Al-doped ZnO films on glass substrates, Hiroaki Hoshino1)*, Kenta Sato1), Md.Suruz Mian1), Yoshio Yasumori2), Kunio Okimura1), 1) School of Engineering, Tokai University, Japan, 2) Tokai Univ. Ctr. Educ. Res. Dev., Japan

TF2-14p Deep ultraviolet optical coating by a combined HIPIMS/CFUBMS deposition technique with Al targets at room temperature, Bo-Huei LIAO*, Chien-Nan Hsiao, Instrument Technology Research Center, Taiwan

TF2-15p Oriented growth of VO2 thin films on conductive TiN/Ti layers and their self-oscillations phenomena, Tomohiro Aoto*, Kenta Sato, Md. Suruz Mian, Kunio Okimura, Tokai University, Japan

TF2-16p Low refractive index MgF2 optical thin films by sputtering and electron beam evaporation, Yoshiki Tsuno1)*, Hiroshi Murotani1), Shigeharu Matsumoto2), 1) Depertment of Optical and Imaging Science & Technology, School of Engineering, Tokai University, Japan, 2) SHINCRON Company Limited, Japan

TF2-17p Alteration of residual stress due to heat treatment of Cu layer in single-, double-film deposited by sputtering, Takuo SAKAI1)*, Tatsuya MATSUE1), Masayuki NISHIDA2), Takao HANABUSA3), 1) National Institude of Technology, Niihama college, Japan, 2) Kobe City College of Technology, Japan), 4) The University of Tokushima, Japan

TF2-18p Heat-resistance evaluation of Si doped DLC thin films, Ryo Nakazawa*, Atsusato Akizawa, Kazunari Ishii, Noriaki Ikenaga, Naoki Ohsawa, Kanazawa Institute of Technology, Japan

TF2-19p Consideration about crystallization the substrate temperature during sputtering deposition and the post-anneal temperature of PZT films, Akihito Saito*, Atsunori Akizawa, Noriaki Ikenaga, Tadashi Fukami, Kanazawa Institute of Technology, Japan

TF2-20p Effect of heat treatment on residual stress of Cu film deposited on steel substrate, Tatsuya Matsue1)*, Masayuki Nishida2), Takao Hanabusa3), 1) National Institude of Technology, Niihama college, Japan, 2) Kobe City College of Technology, Japan, 3) Tokushima University, Japan

TF2-21p Effect of post annealing on properties of ZnO-SnO2 thin film transistors, Kazuo Satoh*, Shuichi Murakami, Yusuke Kanaoka, Yoshiharu Yamada, Yoshiharu Kakehi, Yoshiaki Sakurai, Technology Research Institute of Osaka prefecture, Japan

TF2-22p Study on residual stress characteristic of TiN films prepared by oblique angle deposition, Sung-Hwan Kim*, Ji-Hoon Yang, In-Seop Byeon, Jae-In Jeong, Research Institute of Industrial Science and Technology (RIST), Korea

TF2-23p Effects of hot filament emitter on Fe-based alloy thin film formation by ion-plating process, Miki Shinooka*, Akitaka Sakai, Nobuaki Arai, Helmut Takahiro Uchida, Yoshihito Matsumura, Tokai University, Japan

TF2-24p XPS evaluation on thermal activation process of Zr-V-Fe (St707) alloy films for non evaporable getter applications, Azuma Mishima*, Riki Kuwajima, Takeo Nakano, Kei Oya, Seikei University, Japan

TF2-25p Coating of magnesium alloy with magnesium oxide thin films by RF sputtering, Tsutomu Sonoda, Akira Watazu*, National Institute of Advanced Industrial Science and Technology, Japan

TF2-26p Investigation on the crystallization behavior of Si/CuSi bilayer applied for optical data storage applications, Sin-Liang Ou1)*, An-Cheng Sun2), Kuo-Sheng Kao3), Wei-Jie Zheng3), 1) Da-Yeh University, Taiwan, 2) Yuan-Ze University, Taiwan, 3) Shu-Te University, Taiwan

TF2-27p Inserting a graphene oxide (GO) layer in Cu/SiO2/Pt structure to overcome the performance degradation in a vaporless environment, Chih-Yi Liu1), Chih-Peng Yang1), Shyh-Jer Huang2), Chun-Hung Lai3), Wan-Wei Chih1)*, Chao-Kai Weng1), Yu-Xuan Zhang1), 1) National Kaohsiung University of Applied Sciences, Taiwan, 2) National Cheng Kung University, Taiwan, 3) National United University, Taiwan

TF2-28p Composition dependent magnetic properties of amorphous FeSiBNb thin films, Yuji Fujiwara1)*, Yuuki Takeuchi1), Mutsuko Jimbo2), Tadashi Kobayashi1), 1) Mie University, Japan, 2) Daido University, Japan

Others POSTER

OT2-2p Oxidation behaviors of laminated Al-Hf and Al-Ta multilayer coatings, Yung-I Chen*, Zhi-Ting Zheng, Nai-Yuan Lin, National Taiwan Ocean University, Taiwan

Friday 7 Oral Session

Applications I 9:00-10:40

09:00 KN3 New electronic devices for low power consumption by learning from bio system, Hitoshi Tabata*, The Univeristy of Tokyo, Japan (KEYNOTE)

09:40 AP3-1 The enhanced abrasion resistance of a hydrophobic composite coating on chrome-plated brass substrate by integrating sputtering and atmospheric pressure plasma jet (APPJ) technologies, Chi-Liang Ko1)*, Li-Shun Chen1,2), Xin-Ru Sheng3), Jyun-Teng Chen1), Hsien-Po Wang1), Yu-Lin Kuo1), 1) National Taiwan University of Science and Technology, Taiwan, 2) Chen-I Vacuum Technology Enterprise Co.,Ltd., Taiwan, 3) Click Sun-Shine Corp., Taiwan

10:00 AP3-2 Sputtered IZO thin film for substrate type organometallic halide perovskite solar cells, Peter Chao-Yu Chen*, Chieh-Chung Peng, National Cheng Kung University, Taiwan

10:20 AP3-3 Study of magnetron sputtering deposited ultrathin FeSnOx films for Surface Plasmon Resonance sensors towards gas sensing applications, Martin Kormunda1)*, Andreas Hertwig2), Uwe Beck2), Daniel Fischer2), 1) J.E. Purkinje University, Czech Republic, 2) BAM Bundesanstalt für Materialforschung und – prüfung, Germany

Coffee Break 10:40-11:00

Applications I /Thin Films IV 11:00-12:40

11:00 AP3-4 Development of an evanescent optical integrated sensor in the Mid-Infrared for detection of pollution in groundwater or seawater, Virginie Nazabal1,3)*, Emeline Baudet1,3), Aldo Gutierrez-Arroyo2), Marion Baillieul1), Joel Charrier2), Petr Nemec3), Loic Bodiou2), Jonathan Lemaitre2), Emmanuel Rinnert4), Karine Michel5), Bruno Bureau1), 1) Université de Rennes 1, France, 2) FOTON-UMR-CNRS 6082, France, 3) University of Pardubice, Czech Republic, 4) IFREMER, Laboratoire Détection, Capteurs et Mesures, Dpt. Recherches et Développements Technologiques, France, 5) BRGM, Direction Eau, Environnement et Ecotechnologies, France

11:20 AP3-5 A novel gas barrier foils with encapsulation adhesive properties for flexible OLED devices, Koichi Nagamoto*, Satoshi Naganawa, Tatsuya Izumi, Kenta Nishijima, Mikihiro Kashio, LINTEC Corporation, Japan

11:40 TF3-1 In-situ spectroscopic ellipsometry for characterization and process control of sputtered thin films, Stefan Schoeche*, James Hilfiker, Greg Pribil, Tom Tiwald, Jeff Hale, John Woollam, J.A. Woollam Co., Inc., USA

12:00 TF3-2 A comparative biocompatibility study of graded TiC/a:C coatings prepared by dcMS and HiPIMS, Marcel Meško1)*, Gaby Gotzmann2), Jana Bohovičová1), Frans Munnik3), Mária Čaplovičová4), Ľubomír Vančo4), Ľubomír Čaplovič1), Matthias Krause3), 1) Slovak University of Technology in Bratislava, Faculty of Materials Science and Technology in Trnava, Slovakia, 2) Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, Germany, 3) HZDR, Institute of Ion Beam Physics and Materials Research, Germany, 4) Slovak University of Technology in Bratislava, STU Centre for Nanodiagnostics, Slovakia

12:20 TF3-3 Tribological properties of tin-nitride films prepared by reactive sputtering, Yasushi INOUE1)*, Daiki SATO1), Osamu TAKAI2), 1) Chiba Institute of Technology, Japan, 2) Kanto Gakuin University, Japan

Lunch Break 12:40-14:00

14:00 PP3-1 Plasma etching towards atomic precision, Hiroyuki Miyazoe*, IBM T.J. Watson Research Center, USA (invited)

14:40 PP3-2 Research of gas barrier film of SiOx:C multilayer deposited by RF magnetron sputtering, Hsiao-Lun Chen1)*, Yan-An Lin2), Wei-Bo Liao3), Yan-Yu Liao2), Cheng-Chung Lee3), Chien-Cheng kuo3), 1) Graduate Institute of Energy Engineering, Thin Film Technology Center, National Central University, Taiwan, 2) Department of Mechanical Engineering, National Central University, Taiwan, 3) Department of Optics and Photonics, Thin Film Technology Center, National Central University, Taiwan

15:00 PP3-3 Multi-scale modelisation of TiOx thin films growth produced with a dual magnetron system: from plasma to final film properties., Stephane Lucas1)*, Andreas Pflug2), Romain Tonneau1), Pavel Moskovkin1), 1) University of Namur, Belgium, 2) Fraunhofer Institute for Surface Engineering and Thin Films (IST), Germany

Friday 7 Poster Session 15:20-16:40
(Drinks and Light Meals will be served)

Plasma Processes POSTER

PP3-4p Rf-plasma nitriding of steels with the cathodes made of different kinds of metals, Atsushi Suzuki1)*, Shuichi Asahina2), 1) National Institute of Advanced Industrial Science and Technology (AIST), Japan, 2) Shimane Institute for Industrial Technology, Japan

PP3-5p Magnetron sputtering onto liquid substrates: towards the synthesis of nanoparticles., Xavier Carette1,3), Adrien Chauvin2), Eric Gautron2), Abdel-Aziz El Mel2), Jean-Marie Raquez3), Rony Snyders1), Stephanos Konstantinidis1)*, 1) Laboratory of Plasma-Surface Interaction Chemistry, University of Mons, Belgium, 2) Institut des Matériaux de Nantes, France, 3) Service de chimie des Matériaux Polymères et Composites, University of Mons, Belgium.

PP3-6p TiO2 thin film surfaces treated by O2 plasma in dielectric barrier discharge with assistance of heat treatment, Retsuo Kawakami1)*, Kengo Fujimoto1), Masahito Niibe2), Yuma Yuma Araki2), Yoshitaka Nakano3), Takashi Mukai4), 1) Tokushima University, Japan, 2) University of Hyogo, Japan, 3) Chubu University, Japan, 4) Nichia Corporation, Japan

PP3-7p Effect of superimposed dual frequency operation on the characteristics of internal linear inductively coupled plasma, Dohan Kim1)*, Youjin Ji1), Taehyung Kim1), Dain Sung1), Wonkyun Yeom2), Kyoungnam Kim3), 1) Department of Materials Science and Engineering, Sungkyunkwan University, Korea, 2) SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Korea, 3) Department of Materials Science and Engineering, Daejun University, Korea

PP3-8p Enhancement of electron field emission characteristics of carbon nanotubes using plasma treatment and coating of silicon film, Wen-Ching Shih*, Chen-Pang Huang, Tatung University, Taiwan

PP3-9p Composite divertor materials for fusion reactors, Takuya Washihira*, Kengo Yamaguchi, Fumitaka Ishikawa, Shota Sakano , Helmut Takahiro Uchida , Akira Tonegawa, Yoshihito Matsumura, Tokai University, Japan

PP3-10p Diagnostics of low pressure inductively coupled VHF plasma used for nanostructured carbon deposition, Katsuyuki Okada*, National Institute for Materials Science, Japan

Thin Films POSTER III

TF3-4p Super-hydrophilic thin films deposited by plasma polymerized acrylic acid, Bo-Yi Lin1)*, Wei-Bo Liao2), Cheng-Chung Lee2), Chien-Cheng Kuo2), 1) Department of Mechanical Engineering, National Central University, Taiwan, 2) Thin Film Technology Center, National Central University, Taiwan

TF3-5p Effect of reactive mode transition on growth of TiOx films by high power impulse magnetron sputtering, Makoto Tsukamoto1)*, Felipe Cemin2), Daniel Lundin2), Tetsuhide Shimizu1), Ming Yang1), Tiberiu Minea2), 1) Tokyo Metropolitan University, Japan, 2) Université Paris-Sud, France

TF3-6p Structure and biocompatibility of Ta-(C,N,F) thin films, J. H. Hsieh1), H. T. Lin1)*, S. L. Liu2), 1) Dept. of Materials Eng., Ming Chi University of Technology. Taiwan, 2) National Taipei University of Technology, Taiwan

TF3-7p Ge-Se amorphous thin films: Surface patterning by irradiation, Petr Nemec1)*, I. Csarnovics2), M. Veres3), M.R. Latif4), V. Nazabal5,1), S. Molnar2), S. Kokenyesi6), 1) University of Pardubice, Czech Republic, 2) University of Debrecen, Hungary, 3) Institute of Solid State Physics and Optics, Wigner RCP, Hungary, 4) Boise State University, USA, 5) Université de Rennes 1, France, 6) University of Debrecen, Hungary

TF3-8p Characterizations of tungsten carbide films prepared by filtered pulse arc deposition, Ryo Isono*, Toru Harigai, Yushi Iijima, Yoshiyuki Suda, Hirofumi Takikawa, Toyohashi University of Technology, Japan

TF3-9p Crystallinity enhancement and recrystallization of VO2 thin films during biased reactive sputtering, Kohei Matsuoka*, Nurul Hanis Azhan, Kunio Okimura, Tokai University, Japan

TF3-10p Dependence of self-heating on DLC film properties in filtered arc deposition system, Toru Harigai1)*, Yuma Fujii1), Takahiro Imai1), Yoshiyuki Suda1), Hirofumi Takikawa1), Hideto Tanoue2), Masao Kamiya3), Satoru Kaneko4), Yasui Haruyuki5), Shinsuke Kunitsugu6), Masahiro Kawaguchi7), Kenichi Miura8), 1) Toyohashi University of Technology, Japan, 2) Kitakyushu National College of Technology, Japan, 3) Itoh Optical Industrial Co., Ltd., Japan, 4) Kanagawa Industrial Technology Research Center, Japan, 5) Industrial Research Institute of Ishikawa, Japan, 6) Industrial Technology Center of Okayama Prefecture, Japan, 7) Tokyo Metropolitan Industrial Technology Research Institute, Japan, 8) Technology Research Institute of Osaka Prefecture, Japan

TF3-11p Optical and Mechanical Properties of SiO2 Optical Thin Films by Sputtering and Electron Beam Evaporation, Saki Narita1)*, Hiroshi Murotani1), Shigeharu Matsumoto2), 1) Tokay University, Japan, 2) SHINCRON CO.,LTD., Japan

TF3-12p Surface modification of polydimethylsiloxane (PDMS) due to ultraviolet lamps and active oxygen exposure, Kazuki Hosoya1)*, Ryo Wakayama1), Takumi Suto2), Kei Oya2,3), Satoru Iwamori1,2), 1) Course of Mechanical Engineering, Graduate School of Engineering, Tokai University, Japan, 2) Department of Mechanical Engineering, School of Engineering, Tokai University, Japan, 3) Department of Materials and Life Science, Faculty of Science and Technology, Seikei University, Japan

TF3-13p Characteristics of titanium oxide thin films deposited by reactive sputtering for biomaterial applications, Masato Takeuchi1)*, Kazuki Hosoya2), Kazuki Fukuda1), Naruki Kimura1), Kei Oya1,2), Satoru Iwamori2), Takeo Nakano1), 1) Seikei University, Japan, 2) Tokai University, Japan

Applications POSTER

AP3-6p Anodic aluminum oxidation process on sputtered-Al/AZ91D magnesium alloy for improving the corrosion resistance, JYUN-TENG CHEN*, YAN-JIE WANG, CHI-LIANG KO, YU-LIN KUO, National Taiwan University of Science and Technology, Taiwan

AP3-7p CF4 plasma modification of PVDF-TrFE film with enhanced ferroelectric characteristics, Yi-Pei Jiang1)*, Yu-Jie Lin1), Shun-Hsiang Chan2), Ming-Chung Wu2), Jer-Chyi Wang1,3,4), 1) Department of Electronic Engineering, Chang Gung University, Taiwan, 2) Department of Chemical and Materials Engineering, Chang Gung University, Taoyuan, 3) Chang Gung Memorial Hospital, Taiwan, 4) Ming Chi University of Technology, Taiwan

AP3-8p Biomedical Applications of 3D printing ABS material by O2 plasma treatment and graft polymer hydrogel, Ying-Cien Ye1)*, Bo-Han Zeng1), Jui-Wen Sun1), Hao-Hueng Chang2), Yu-Ting Li3), Shu-Chaun Liao1), 1) Da-Yeh University, Taiwan, 2) School of Dentistry, National Taiwan University, Taiwan, 3) Graduate Institute of Oral Biology School of Dentistry, National Taiwan University, Taiwan

AP3-9p Surface modified by O2 plasma and UV-light polymerization immobilization of chlorhexidine with antibacterial properties, Bo-Han Zeng1)*, Ying-Cien Ye1), Rui-Wen Sung1), Hao-Hueng Chang2), Shu-Chaun Liao1), 1) Da-Yeh University,Taiwan, 2) School of Dentistry, National Taiwan University, Taiwan

AP3-10p Plasma-polymerized HMDSO/O2 and UV-light graft Allylamine immobilized gelatin on pure Ti for biomedical applications, Rui-Wen Sung1)*, Ying-Cien Ye1), Bo-Han Zeng1), Hao-Hueng Chang2), Yu-Ting Li3), Shu-Chaun Liao1), 1) Da-Yeh University, Taiwan, 2) School of Dentistry, National Taiwan University, Taiwan, 3) Graduate Institute of Oral Biology School of Dentistry, National Taiwan University, Taiwan

AP3-11p New Cu(RuAgNx) copper alloy films for medical applications, Chon-Hsin Lin*, Asia-Pacific Institute of Creativity, Taiwan

AP3-12p Revised sputtering erosion and temperature of beryllium plate under fusion relevant conditions, Yasunori Nejoh1)*, Nobuo Mizuno2), 1) Hachinohe Institute of Technology, Japan, 2) Nihon University, Japan

AP3-13p Study on temperature properties of divertor plates in nuclear fusion devices, Nobuo Mizuno1)*, Takuma Howashi2), Hiroki Sugizaki2), YasuNori Nejoh3), 1) College of Humanities and Sciences, Nihon University, Japan, 2) Graduate School of Integrated Basic Sciences, Nihon University, Japan, 3) Hachinohe Institute of Technology, Japan

AP3-14p Ground-based simulation of low earth orbit (LEO) space environment using laser-induced oxygen/argon plasma, Kumiko Yokota*, Yusuke Fujimoto, Ryota Okura, Kazuki Kita, Masahito Tagawa, Kobe University, Japan

AP3-15p The deposition of inorganic/organic composite film using atmospheric pressure plasma jet for enhancing the corrosion resistance of AZ91D, Yu-Lin Kuo*, Jie-Long Wang, Chi-Liang Ko, Jhao-Yu Kuo, Ke-Chi Fu, National Taiwan University of Science and Technology, Taiwan

AP3-16p Fabrication of SiO2 and SiN diaphragms supported on a Si substrate using inward plasma etching, Jun Miyawaki1)*, Toshitaka Kubo1), Atsushi Ando1), Satoshi Takahashi2), Shun'ichiro Shimbori2), Tetsuo Shimizu1), 1) National Institute of Advanced Industrial Science and Technology, Japan, 2) Sanyu Co.,Ltd., Japan

AP3-17p Carbon based emitter assisted non-thermal plasma reforming for hydrogen production, Hoang-Jyh Leu1,3)*, Kuo-Feng Chiu1,2), Pei-Chi Liu2), 1) Master's Program of Green Energy Science and Technology, Feng Chia University, Taiwan, 2) Department of Materials Science and Engineering, Feng Chia University, Taiwan, 3) Green Energy Development Center, Feng Chia University, Taiwan

AP3-18p Using atmospheric pressure plasma in the preparation of 100% Grey cotton knitted Fabric, Chi-wai Kan*, Chui-fung Lam, The Hong Kong Polytechnic University, Hong Kong


Contact to: ISSP2017 Office (Contact Information)